化学气相沉积,chemical vapor deposition
1)chemical vapor deposition化学气相沉积
1.Study on PPy/UHMWPE fiber prepared bychemical vapor deposition;化学气相沉积PPy/UHMWPE纤维的研究
2.Preparation of In_2O_3 nanowires by single-sourcechemical vapor deposition method;单源化学气相沉积法制备In_2O_3纳米线
3.Dielectric properties of aluminum-doped silcion carbide usingchemical vapor deposition;化学气相沉积铝掺杂碳化硅的微波介电特性
英文短句/例句
1.thermally activated chemical vapour deposition热活化化学气相沉积
2.plasma activated chemical vapour deposition等离子体化学气相沉积
3.epitaxial CVD growth外延化学气相沉积生长
4.Study of CVD Function coating on Molybdenum Substrate钼表面化学气相沉积功能涂层的研究
5.Preparation of SiC Filament by Chemical Vapor Deposition;化学气相沉积法制备钨芯SiC纤维
6.Fabrication of Superconducting Magnesium Diboride Thin Film by Chemical Vapor Deposition;化学气相沉积法制备MgB_2超导薄膜
7.Synthesis of Continuous Carbon Nanotube Fibers by CVD Method;化学气相沉积合成连续碳纳米管纤维
8.Application of CAD Technique in Moulds;化学气相沉积技术在工模具中的应用
9.Silicon Carbon Nitride Thin Film Grown by Hot-Filament Chemical Vapor Deposition热丝化学气相沉积制备SiCN薄膜的研究
10.Research on the Preparation of Ultrafine Nickel Powder by Chemical Vapor Deposition化学气相沉积法制备超细镍粉的研究
11.GaN Semiconductor Thin Film Prepared by Chemical Vapor Deposition化学气相沉积GaN半导体薄膜的研究
12.The Research on the Gas Phase Process of Electron-Assisted Chemical Vapor Deposition from CH_4/H_2 Mixture Gas;CH_4/H_2系统电子助进化学气相沉积气相过程研究
13.INFLUENCE OF CARRIER GAS ON THE DEPOSITION RATE OF SYNTHETIC SILICA GLASS BY CHEMICAL VAPOR DEPOSITION METHOD载料气体对化学气相沉积合成石英玻璃沉积速率的影响(英文)
14.The Preparation of Carbon Nanomaterials with Coal Gas as Carbon Feedstock via CVD Technique;化学气相沉积法由煤气制备炭纳米材料的研究
15.Deposition of Al_2O_3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method静电辅助气溶胶化学气相沉积法制备Al_2O_3薄膜
16.Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method静电辅助的气溶胶化学气相沉积法制备Y_2O_3薄膜
17.Quantum chemistry methods and their applications to CVD reaction system化学气相沉积反应研究的量子化学方法及应用
18.Study on mechanism of CVD molybdenum films from Molybdenum Hexacarbonyl羰基钼化学气相沉积成膜机制及相关因素研究
相关短句/例句
CVD化学气相沉积
1.Growth of carbon nanotubes on SiO_2-particle substrates viaCVD method;利用化学气相沉积法在SiO_2小球基底上制备纳米碳管的研究(英文)
2.Research Status on the Adhesion between Substrate and Diamond Film Deposited byCVD;化学气相沉积金刚石薄膜刀具膜/基附着性能研究现状
3.Study onCVD for Tungsten Coating and Capability of its Anti-ablation;化学气相沉积钨涂层及抗烧蚀性能研究
3)chemical vapour deposition化学气相沉积
1.Preparation of tellurium films with spectral selectivity bychemical vapour deposition method;化学气相沉积法制备光谱选择性碲膜
2.Silicon nitride films prepared by helicon wave plasam-enhancedchemical vapour deposition;螺旋波等离子体增强化学气相沉积氮化硅薄膜
3.A new glass coating technology to combine the method of ionic pervasion colouration with the technique ofchemical vapour deposition was adapted.将离子渗透着色技术(IPC)和化学气相沉积技术(CVD)加以结合,在浮法玻璃生产线的锡槽内和AO区进行2次镀膜形成复合膜,克服了单一镀膜技术存在的不足。
4)chemical vapor deposition (CVD)化学气相沉积
1.Ultrafine powders coating in fluidized bed reactor by chemical vapor deposition (CVD) method to synthesize TiO_2-ZnS composites were studied.为了制备TiO2-ZnS复合粒子,采用流态化化学气相沉积(CVD)法,探讨了其包覆工艺,借助SEM、XRD、EPMA等测试手段研究了复合粒子结构和包覆过程特征。
2.A new kind of silicon oxidic film on aluminum was prepared by chemical vapor deposition (CVD) in ambient pressure.本研究采用常压化学气相沉积(CVD)的方法在金属铝基底上制备出硅氧化合物陶瓷膜层。
3.Diamond films have been deposited on carbon steel with an intermediate layer by chemical vapor deposition (CVD).利用表面预镀中间层在４５号钢上化学气相沉积（ＣＶＤ）得到了金刚石膜。
5)chemical vapor deposition(CVD)化学气相沉积
1.A thin layer of carbon was coated onto SiC fiber through chemical vapor deposition(CVD).采用化学气相沉积的方法,在SiC纤维表面沉积了一层C涂层,通过拉伸实验对涂C前后的SiC纤维强度进行比较分析,用扫描电子显微镜对其形貌进行观察。
2.GaN films grown on Si substrates were obtained by hot-wall chemical vapor deposition(CVD), magnetron sputtering and electrophoretic deposition techniques.分别采用射频磁控溅射、热壁化学气相沉积(CVD)、电泳沉积法制备GaN薄膜。
6)chemical vapor deposition(CVD)化学气相沉积(CVD)
延伸阅读
化学气相沉积分子式：CAS号：性质：利用气相化学反应在基底上沉积另一种固体材料的方法，常用于制取固体薄膜。化学气相沉积过程包括气相反应物的生成、气相反应物的输运和沉积。利用化学气相沉积方法可以得到从非晶态、晶态到外延单晶薄膜等各种材料，是一种应用非常广泛的化学合成方法。化学气相沉积还可以用于制备多种高熔点化合物薄膜。例如，高熔点的四氮化三硅可以利用氨和硅烷反应得到。其他如二氧化硅和氧化铝等薄膜也可以用此法制取。化学气相沉积在半导体材料和器件的制备中具有重要的用途。在半导体器件的制备中常常需要在半导体表面生长一定厚度的另一种电学性能不同的半导体单晶薄膜，这种薄膜可以利用化学气相沉积或化学气相外延的方法制取。
