200字范文 > 大气压等离子体化学气相沉积 atmospheric-pressure plasma chemical vapor depos

大气压等离子体化学气相沉积 atmospheric-pressure plasma chemical vapor depos

时间：2022-12-30 00:09:17

大气压等离子体化学气相沉积,atmospheric-pressure plasma chemical vapor deposition (AP-PCVD)

1)atmospheric-pressure plasma chemical vapor deposition (AP-PCVD)大气压等离子体化学气相沉积

1.In order to avoid the use of expensive vacuum equipment and complicated discharge system,atmospheric-pressure plasma chemical vapor deposition (AP-PCVD),which attracted much attention recently,was employed.本论文以SiCl_4为前驱体直接制备多晶硅,并采用具有应用优势且在近些年颇受关注的大气压等离子体化学气相沉积法,有效的利用了多晶硅工业的副产物,为安全、环保、低成本生长多晶硅探索了新的途径。

英文短句/例句

1.Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断

2.plasma activated chemical vapour deposition等离子体化学气相沉积

3.Modification of silk fabric via atmospheric pressure plasma liquid deposition丝织物的大气压等离子体液相沉积处理

4.The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究

5.Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究

6.SiO_x-like coating on cotton fabric by atmospheric pressure plasma大气压等离子体沉积棉织物类氧化硅薄膜(英文)

7.Diamond thin films grown up by microwave plasma CVD微波等离子体化学气相沉积金刚石簿膜

8.WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP微波等离子体化学气相沉积装置的工作原理

9.Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;磁激活等离子体增强化学气相沉积设备的研制

10.The Study on DLC Films Deposited by PECVD;等离子体增强化学气相沉积DLC膜的研究

11.Study on device of magneto-active PECVD;磁激活增强等离子体化学气相沉积设备的研制

12.The Effect of Bias on Low Pressure Plasma-Enhanced Chemical Vapour Deposition of TiO_2 Film and its Structure and Performance偏压对低气压等离子体增强化学气相沉积TiO_2薄膜的结构和性能的影响

13.Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究

14.TEM Study on Diamond Films Deposited by MPCVD;微波等离子体化学气相沉积金刚石薄膜的电子显微学分析

15.Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究

16.ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD微波等离子体化学气相沉积金刚石薄膜形貌分析

17.NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH新型微波等离子体化学气相沉积金刚石薄膜装置

18.Research on High Quality Diamond Films in Microwave Plasma CVD;微波等离子体化学气相沉积法制备高质量金刚石膜研究

相关短句/例句

plasma chemical vapor deposition等离子体化学气相沉积

1.Influence of discharge current on hot cathodeplasma chemical vapor deposition of diamond films;放电电流对热阴极等离子体化学气相沉积金刚石膜影响

2.Effect ofplasma chemical vapor deposition parameters on electron property in Ar plasma;等离子体化学气相沉积参量对Ar等离子体电子特性的影响

3.The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow dischargeplasma chemical vapor deposition process was discussed.研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。

3)PCVD等离子体化学气相沉积

1.DEPOSITION THEORY OF THIN HARDPCVD COATINGS;等离子体化学气相沉积(PCVD)硬质膜成膜理论

2.Si B N composite films had been prepared at proper processing parameters by RFPCVD.使用工业射频等离子体化学气相沉积 (RF -PCVD)设备 ,通过控制合理的工艺参数 ,在不同的基体负偏压下 ,分别制备出了Si B N非晶以及含有h BN、c BN显著结晶相的Si B N复合薄膜。

3.SnO 2 Sb thin film is prepared withPCVD The film possesses better gas sensitivity When temperature rises, the response time maintains almost the same but the recovery time reduces and the sensibility gets higher When the temperature reaches 200℃ or more, the sensitivity maintains stable The difference between the sensibility of the resistors of different resistance is small (4 refs利用等离子体化学气相沉积法制备了ＳｎＯ２－Ｓｂ导电薄膜，测试了ＳｎＯ２－Ｓｂ的气敏效应。

4)Plasma CVD等离子体化学气相沉积

5)PECVD等离子体化学气相沉积

1.Study on device of magneto-activePECVD;磁激活增强等离子体化学气相沉积设备的研制

6)plasma enhanced chemical vapor deposition等离子体化学气相沉积

1.Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.等离子体化学气相沉积技术制备氢化硅薄膜工艺条件成熟稳定而成为薄膜制备的首选方法。

2.This review will describe the deposition methods, properties and some applications of DLC films by Plasma Enhanced Chemical Vapor Deposition.这篇综述介绍了用等离子体化学气相沉积DLC膜的沉积方法、所制备薄膜的性能及应用,最后展望了DLC膜的发展趋势。